A study of the optimization of parameters for pulsed laser deposition using Monte Carlo simulation

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2754-2759

  Xu, X H ^a,b   Zhang, R Q ^b   Dong, X Z ^b   Gehring, G A ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b SHANXI NORMAL UNIVERSITY   (China)

Author keywords

Laser ablation; Monte Carlo simulations; Morphology; Surface roughness

Indexed keywords

ABSORPTION; COMPUTER SIMULATION; KINETIC ENERGY; MONOLAYERS; MONTE CARLO METHODS; OPTIMIZATION;

INTERATOMIC INTERACTIONS; MORSE POTENTIAL; SUBMONOLAYER FILMS;

PULSED LASER DEPOSITION;

EID: 33750810883     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.004     Document Type: Article

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