Compact electron-based EUV source for at-wavelength metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5448, Issue PART 2, 2004, Pages 693-703

  Egbert, André ^a   Tkachenko, Boris ^a   Becker, Stefan ^a   Chichkov, Boris N ^b  

^a Phoenix/euv Systems + Services GmbH   (Germany)

^b LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

EUV lithography; EUV metrology; Extreme ultraviolet source

Indexed keywords

BERYLLIUM; CAMERAS; CHARGE COUPLED DEVICES; ELECTRON EMISSION; MEASUREMENT THEORY; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; SEMICONDUCTING SILICON; SPECTROGRAPHS; SYNCHROTRONS; ULTRAVIOLET RADIATION; X RAY TUBES;

COMPUTER CHIPS; EUV LITHOGRAPHY; EUV METROLOGY; EXTREME ULTRAVIOLET (EUV) SOURCES;

ULTRAVIOLET DEVICES;

EID: 11844280362     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.547029     Document Type: Conference Paper

References (6)

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