메뉴 건너뛰기




Volumn 62, Issue 15, 2004, Pages 1415-1418

Influence of formaldehyde on the electrochemistry and chemical etching of silicon in alkaline solutions

Author keywords

Chemical etching; Formaldehyde; Oxidizing agent; Pyramid suppression; Silicon

Indexed keywords


EID: 33750510740     PISSN: 05677351     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.