Observation of extended copper passivity in carbonate solutions and its future application in copper CMP

Electrochemical and Solid-State Letters

Volumn 8, Issue 12, 2005, Pages

  Ein Eli, Y ^a,b   Abelev, E ^a,b   Auinat, M ^a,b   Starosvetsky, D ^a,b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b ELECTROCHEMICAL SOCIETY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONATE SOLUTIONS; CHEMICAL MECHANICAL PLANARIZATION (CMP); COPPER CMP; COPPER PASSIVITY;

ABRASION; CARBONATES; CONCENTRATION (PROCESS); FRICTION; PASSIVATION; SURFACE PHENOMENA;

COPPER;

EID: 28044431610     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2096432     Document Type: Article

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