Surface oxidation and thin film preparation of AlCuFe quasicrystals

Progress in Surface Science

Volumn 81, Issue 10-12, 2006, Pages 488-514

  Rouxel, D ^a   Pigeat, P ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Al diffusion; Crystallization kinetics; Etching cones; i AlCuFe; Optical emissivity; Oxidation; Quasicrystals; Surface energy; Surface properties; Thin films

Indexed keywords

AL DIFFUSION; CRYSTALLIZATION KINETICS; ETCHING CONES; SURFACE OXIDATION; THIN FILM PREPARATION;

ALUMINUM COMPOUNDS; ETCHING; INTERFACIAL ENERGY; LIGHT EMISSION; OXIDATION; OXYGEN; PRESSURE EFFECTS; SURFACE PROPERTIES; THIN FILMS;

QUASICRYSTALS;

EID: 33750004468     PISSN: 00796816     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progsurf.2006.07.002     Document Type: Review

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