X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al

Applied Optics

Volumn 45, Issue 18, 2006, Pages 4303-4309

  Hsu, Jin Cherng ^a   Wang, Paul W ^b   Lee, Cheng Chung ^c  

^a FU JEN CATHOLIC UNIVERSITY   (Taiwan)

^b BRADLEY UNIVERSITY   (United States)

^c NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BINDING ENERGY; CHEMICAL BONDS; ION BEAM ASSISTED DEPOSITION; LIGHT ABSORPTION; OPTICAL PROPERTIES; OXYGEN; SPUTTER DEPOSITION; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STRUCTURES; COSPUTTERED FILMS; COSPUTTERING; OXYGEN BONDING;

THIN FILMS;

EID: 33749561645     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.004303     Document Type: Article

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