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Volumn 2006, Issue , 2006, Pages 193-198

1/f gate tunneling current noise model of ultrathin Oxide MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

DRAIN VOLTAGE; GATE NOISE; GATE POLYDEPLETION; ULTRATHIN OXIDES;

EID: 33749520204     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMTS.2006.1614302     Document Type: Conference Paper
Times cited : (4)

References (15)
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  • 2
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  • 4
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  • 5
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  • 6
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    • November
    • J. Lee and G Bosman, "Defect spectroscopy using 1/f_ noise of gate leakage current in ultrathin oxide MOSFETs,", Solid-State Electronics, Volume 47, Issue 11, November 2003, Pages 1973-1981.
    • (2003) Solid-state Electronics , vol.47 , Issue.11 , pp. 1973-1981
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  • 7
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.