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Volumn 89, Issue 13, 2006, Pages
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Modulating the thickness of the resist pattern for controlling size and depth of submicron reversed domains in lithium niobate
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTALS;
ELECTRIC FIELD EFFECTS;
LITHIUM NIOBATE;
LITHOGRAPHY;
PHOTONS;
ELECTRIC FIELD DISTRIBUTION;
INTERFERENCE LITHOGRAPHY;
MODULATED TOPOGRAPHY;
TWO-DIMENSIONAL RESIST GRATINGS;
CRYSTALLINE MATERIALS;
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EID: 33749251245
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2357928 Document Type: Article |
Times cited : (17)
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References (13)
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