Characterization of the gray-scale photolithography with high-resolution gray steps for the precise fabrication of diffractive optics

Optical Engineering

Volumn 43, Issue 11, 2004, Pages 2666-2670

  Lu, Ying Tsung ^a   Chu, Chang Sheng ^a   Lin, Hoang Yan ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Diffractive optical element; Gray scale lithography; High energy beam sensitive glass

Indexed keywords

COMPUTER SIMULATION; DENSITY (OPTICAL); MATHEMATICAL MODELS; OPTICAL DEVICES; OPTICAL GLASS; PHOTOLITHOGRAPHY;

DIFFRACTIVE OPTICAL ELEMENT; GRAY SCALE LITHOGRAPHY; HIGH ENERGY BEAM SENSITIVE GLASS;

DIFFRACTIVE OPTICS;

EID: 11244305610     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1801411     Document Type: Article

References (8)

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