Double-face and submicron two-dimensional domain patterning in congruent lithium niobate

IEEE Photonics Technology Letters

Volumn 18, Issue 3, 2006, Pages 541-543

  Grilli, Simonetta ^a   Ferraro, Pietro ^a   Sansone, Lucia ^a   Paturzo, Melania ^b   De Nicola, Sergio ^c   Pierattini, Giovanni ^c   De Natale, Paolo ^a  

^a ISTITUTO NAZIONALE DI OTTICA   (Italy)

^b UNIVERSITY OF FLORENCE   (Italy)

^c CNR   (Italy)

Author keywords

Electric field poling; Interference lithography; Lithium niobate (LN); Microstructure fabrication

Indexed keywords

COMPLEX STRUCTURE; CONGRUENT LITHIUM NIOBATE; CRYSTAL FACE; DIFFERENT DOMAINS; DOMAIN PATTERN; ELECTRIC FIELD POLING; FABRICATION TECHNIQUE; FREQUENCY CONVERSIONS; INTERFERENCE LITHOGRAPHY; LITHIUM NIOBATE; LITHOGRAPHIC PROCESS; MICROSTRUCTURE FABRICATION; OVERPOLING REGIMES; PHOTONIC BANDGAP DEVICES; SHORT-WAVELENGTH; SUBMICRON; TWO-DIMENSIONAL DOMAIN;

ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; FABRICATION; LITHOGRAPHY; MICROSTRUCTURE; NIOBIUM COMPOUNDS; PHOTONIC DEVICES; PHOTORESISTS; TWO DIMENSIONAL;

LITHIUM;

EID: 33749239464     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2005.863626     Document Type: Article

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