Helicon-wave-excited plasma sputtering deposition of Ga-doped ZnO transparent conducting films

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 11, 2006, Pages 2882-2886

  Sugiyama, Mutsumi ^a   Murayama, Akira ^a   Imao, Takashi ^a   Saiki, Keita ^a   Nakanishi, Hisayuki ^a   Chichibu, Shigefusa F ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURE; HELICON-WAVEEXCITED PLASMA SPUTTERING (HWPS); SPECTRAL WAVELENGTHS; TRANSPARENT CONDUCTING FILMS;

DOPING (ADDITIVES); GALLIUM; GRAIN SIZE AND SHAPE; OPACITY; PLASMA APPLICATIONS; SPUTTER DEPOSITION; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 33749003448     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200669616     Document Type: Article

References (16)

1. I. Hamberg and C. G. Granqvist, J. Appl. Phys. 60, R123 (1986).
2. J. C. Phillips, Bonds and Bands in Semiconductors (Academic, New York, 1973), p. 22.
3. H. J. Ko, Y. F. Chen, S. K. Hong, H. Wenisch, and T. Yao, Appl. Phys. Lett. 77, 3761 (2000).
4. T. Minami, H. Nanto, and S. Takata, Jpn. J. Appl. Phys. 23, L280 (1984).
5. T. Minami, K. Oohashi, and S. Takata, Thin Solid Films 193/194, 721 (1990).
6. Y. H. Lee, M. H. Song, and B. K. Ju, J. Vac. Sci. Technol. B 15, 512 (1997).
7. K. Ogata, T. Kawanishi, K. Maejima, K. Sakurai, Sz. Fujita, and Sg. Fujita, Jpn. J. Appl. Phys. 40, L657 (2001).
8. A. Suzuki, T. Matsushita, Y. Sakamoto, N. Wada, T. Fukuda, H. Fujiwara, and M. Okuda, Jpn. J. Appl. Phys. 35, 5457 (1996).
9. Z. Y. Ning, S. H. Cheng, S. B. Ge, Y. Chao, Z. Q. Gang, Y. X. Zhang, and Z. G. Liu, Thin Solid Films 50, 307 (1997).
10. K. Yamaya, Y. Yamaki, H. Nakanishi, and S. Chichibu, Appl. Phys. Lett. 72, 235 (1998).
11. F. Chen, J. Vac. Sci. Technol. A 10, 1389 (1992).
12. R. Boswell, in: Proceedings of 21st International Conference on Phenomena in Ionised Gases, edited by G. Ecker, U. Arendt, J. Boseler, and A. Brunn (Arbeitsgemeinschaft Plasma Physik, Bochum, 1993), p. 18.
13. T. Nakano, K. Giapis, R. Gottscho, T. Lee, and N. Sadeghi, J. Vac. Sci. Technol. B 11, 2046 (1993).
14. S. F. Chichibu, T. Yoshida, T. Onuma, and H. Nakanishi, J. Appl. Phys. 91, 874 (2002).
15. T. Koyama, T. Onuma, and S. F. Chichibu, Appl. Phys. Lett. 83, 2973 (2003).
16. T. Watari, Phys. Fluids 21, 2076 (1978).