Kinetics of NiSi-to-NiSi2 transformation and morphological evolution in nickel silicide thin films on Si(0 0 1)

Acta Materialia

Volumn 54, Issue 18, 2006, Pages 4905-4911

  Ma, D ^a,b   Chi, D Z ^a   Loomans, M E ^a   Wang, W D ^a   Wong, A S W ^a   Chua, S J ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Ceramics; Compression test; Finite element analysis; Fracture; Granular microstructure

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CERAMIC MATERIALS; COMPRESSION TESTING; FINITE ELEMENT METHOD; FRACTURE; GRAIN GROWTH; MICROSTRUCTURE; NUCLEATION; PHASE TRANSITIONS; THIN FILMS;

GRANULAR MICROSTRUCTURES; MORPHOLOGICAL EVOLUTION; NICKEL SILICIDE; TIME-TEMPERATURE TRANSFORMATION;

NICKEL COMPOUNDS;

EID: 33748984090     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2006.06.042     Document Type: Article

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