Fine pattern fabrication on SnO2: Sb thin films formed by the sol-gel process

Surface and Interface Analysis

Volumn 38, Issue 9, 2006, Pages 1291-1295

  Ying, Li ^a   Gaoyang, Zhao ^a   Weihua, Zhang ^a   Yuanqing, Chen ^a  

^a XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Fine patterning; Photosensitivity; SnO2 films; Sol gel

Indexed keywords

HEAT TREATMENT; MERCURY VAPOR LAMPS; PHOTOSENSITIVITY; SOL-GELS; TIN COMPOUNDS; ULTRAVIOLET RADIATION;

ABSORPTION BAND; FINE PATTERNING; SNO2 FILMS; SODIUM ALKOXIDE (NAOR;

THIN FILMS;

EID: 33748927696     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2442     Document Type: Article

References (13)

1. Oliver K, Chitra A, Jurgen H, et al. In 3rd World Conference on Photovoltaic Energy Conversion (WCPEC-3), Osaka, Japan, 2003.
2. Radecka M, Przewoznik J, Zakrzewska K. Thin Solid Films 2001; 391: 247.
3. Alam MJ, Cameron DC. Thin Solid Films 2000; 377-378: 455.
4. Weber H, Matz R, Weimann G. Appl. Phys. 1996; A 63: 415.
5. Sugano K, Tabata O. Microsyst. Techno. 2002; 9: 11.
6. Lee YJ, Bae JW, Han HR, Kim JS, Yeom GY. Thin Solid Films 2001; 383: 281.
7. Wang K, Chelnokov A, Rowson S, Lourtioz JM. Appl. Phys. 2003; A 76: 1013.
8. Gaoyang Z, Weihua Z, Zehui D. Mater. Res. Bull. 2004; 39: 449.
9. Weihua Z, Gaoyang Z, Zhiming C. Mater. Sci. Eng. 2003; B99: 168.
10. Tohge N, Shinmou K, Minami T. J. Sol-Gel Sci. Techno. 1994; 2: 581.
11. Zhao G, Li Y, Zhang W, Zhao W. OSA Trends in Optics and Photonics (TOPs), vol. 99. In Photorefractive Effects, Materials, and Devices Proceedings, vol. 281, Sanya, China, 2005.
12. Huangill X, Tornatore P, Li Y-S. Electrochim. Acta 2000; 46: 671.
13. Moulder JF, Stickle WF, Sobol PE, Bomben KD. Handbook of X-ray Photoelectron Spectroscopy. Perkin-Elmer Corp: Minnesota, MN, 1992.