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Volumn 63, Issue 5, 1996, Pages 415-419
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A laser dry etch process for smooth continuous relief structures in InP
a a b,c
a
SIEMENS AG
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
EXCIMER LASERS;
LASER APPLICATIONS;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
PHOTOTHERMAL HEATING;
ETCHING;
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EID: 0030283426
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/BF01571666 Document Type: Article |
Times cited : (3)
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References (15)
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