메뉴 건너뛰기




Volumn 2005, Issue , 2005, Pages 435-439

Spectroscopy infrared characterization of annealed silicon rich oxide films

Author keywords

Refractive index; Silicon rich oxide; Spectroscopy infrared

Indexed keywords

ABSORPTION SPECTRA; REACTIVE GASES; SILICON RICH OXIDE (SRO); THERMAL OXIDE;

EID: 33748891778     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICEEE.2005.1529663     Document Type: Conference Paper
Times cited : (4)

References (15)
  • 3
    • 0021405389 scopus 로고    scopus 로고
    • Enhanced conduction and minimized charge trapping in electrically alterable read-only memories using off-stoichiometric silicon dioxide films
    • D. J. DiMaria, D. W. Dong, F. L. Pesavento, "Enhanced conduction and minimized charge trapping in electrically alterable read-only memories using off-stoichiometric silicon dioxide films", J. Appl. Phys. 1984; 55 (8): 3000-3019.
    • J. Appl. Phys. 1984 , vol.55 , Issue.8 , pp. 3000-3019
    • Dimaria, D.J.1    Dong, D.W.2    Pesavento, F.L.3
  • 5
    • 2442517663 scopus 로고    scopus 로고
    • Comparative investigation of hydrogen bonding in silicon based PECVD grow dielectrics for optical waveguides
    • F. Ay, A. Aydinli, "Comparative investigation of hydrogen bonding in silicon based PECVD grow dielectrics for optical waveguides", Optical Materials, Vol. 26, Pag. 33-46, 2004.
    • (2004) Optical Materials , vol.26 , pp. 33-46
    • Ay, F.1    Aydinli, A.2
  • 6
    • 0020736362 scopus 로고
    • Plasma deposition of inorganic films
    • Abril
    • A.C. Adams, "Plasma Deposition of Inorganic Films", Solid State Technology, Pag. 135-139, Abril 1983.
    • (1983) Solid State Technology , pp. 135-139
    • Adams, A.C.1
  • 7
    • 33847571146 scopus 로고
    • Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition
    • P. G, Pai, S. S. Chao, Y. Takagi, and G. Lucovsky, "Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition", J. Vac. Sci. Technol., A4, 689 (1986).
    • (1986) J. Vac. Sci. Technol. , vol.A4 , pp. 689
    • Pai, P.G.1    Chao, S.S.2    Takagi, Y.3    Lucovsky, G.4
  • 12
    • 33748895990 scopus 로고    scopus 로고
    • Relation entre las caracteristicas del SRO medidas mediante AFM, FTIR y FL
    • thesis master
    • Ed Heriberto Palomino, "Relation entre las caracteristicas del SRO medidas mediante AFM, FTIR y FL", INAOE, thesis master, 2005.
    • (2005) INAOE
    • Palomino, E.H.1
  • 13
    • 0000332037 scopus 로고    scopus 로고
    • Correlation between luminescence and structural properties of Si nanocrystals
    • Iacona F., Franzo G., and Spinella C., "Correlation between luminescence and structural properties of Si nanocrystals", J. Appl. Phys. 87, pp. 1295 (2000).
    • (2000) J. Appl. Phys. , vol.87 , pp. 1295
    • Iacona, F.1    Franzo, G.2    Spinella, C.3
  • 14
    • 0347334829 scopus 로고    scopus 로고
    • Cathodoluminiscence properties of silicon nanocrystallites embedded in silicon oxide thin films
    • Inokuma T., Kurata Y. and Hasewaga S. "Cathodoluminiscence properties of silicon nanocrystallites embedded in silicon oxide thin films. Journal of Electroluminescence, 80 (1999) 247-251.
    • (1999) Journal of Electroluminescence , vol.80 , pp. 247-251
    • Inokuma, T.1    Kurata, Y.2    Hasewaga, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.