-
1
-
-
0000772160
-
-
de Heer W.A., Basca W.S., Chatelain A., Gerfin T., Humphreybaker R., Forro L., and Ugarte L.D. Science 268 (1995) 845
-
(1995)
Science
, vol.268
, pp. 845
-
-
de Heer, W.A.1
Basca, W.S.2
Chatelain, A.3
Gerfin, T.4
Humphreybaker, R.5
Forro, L.6
Ugarte, L.D.7
-
5
-
-
0000297469
-
-
Nilsson L., Groening O., Emmenegger C., Kuettel O., Schaller E., Schlapbach L., Kind H., Bonard J.-M., and Kern K. Appl. Phys. Lett. 76 (2000) 2071
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 2071
-
-
Nilsson, L.1
Groening, O.2
Emmenegger, C.3
Kuettel, O.4
Schaller, E.5
Schlapbach, L.6
Kind, H.7
Bonard, J.-M.8
Kern, K.9
-
6
-
-
0034825622
-
-
Bonard J.M., Weiss N., Kind H., Stöckli T., Forró L., Kern K., and Châtelain A. Adv. Mater. (Weinh., Ger.) 13 (2001) 184
-
(2001)
Adv. Mater. (Weinh., Ger.)
, vol.13
, pp. 184
-
-
Bonard, J.M.1
Weiss, N.2
Kind, H.3
Stöckli, T.4
Forró, L.5
Kern, K.6
Châtelain, A.7
-
7
-
-
0037670223
-
-
Choi J.H., Lee T.Y., Choi S.H., Han J.H., Yoo J.B., Park C.Y., Jung T., Yu S., Yi W., Han I.T., and Kim J.M. Thin Solid Films 435 (2003) 318
-
(2003)
Thin Solid Films
, vol.435
, pp. 318
-
-
Choi, J.H.1
Lee, T.Y.2
Choi, S.H.3
Han, J.H.4
Yoo, J.B.5
Park, C.Y.6
Jung, T.7
Yu, S.8
Yi, W.9
Han, I.T.10
Kim, J.M.11
-
8
-
-
79956056814
-
-
Tu Y., Huang Z.P., Wang D.Z., Wen J.G., and Ren Z.F. Appl. Phys. Lett. 80 (2002) 4018
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 4018
-
-
Tu, Y.1
Huang, Z.P.2
Wang, D.Z.3
Wen, J.G.4
Ren, Z.F.5
-
9
-
-
0001757428
-
-
Merkulov V.I., Lowndes D.H., Wei Y.Y., Eres G., and Voelkl E. Appl. Phys. Lett. 76 (2000) 3555
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 3555
-
-
Merkulov, V.I.1
Lowndes, D.H.2
Wei, Y.Y.3
Eres, G.4
Voelkl, E.5
-
10
-
-
0036799381
-
-
Jeong S.-H., Lee O.-J., Lee K.-H., Oh S.H., and Park C.G. Chem. Mater. 14 (2002) 4003
-
(2002)
Chem. Mater.
, vol.14
, pp. 4003
-
-
Jeong, S.-H.1
Lee, O.-J.2
Lee, K.-H.3
Oh, S.H.4
Park, C.G.5
-
11
-
-
4344586352
-
-
Yen J.-H., Leu I.-C., Wu M.-T., Lin C.-C., and Hon M.-H. Electrochem. Solid-State Lett. 7 (2004) H29
-
(2004)
Electrochem. Solid-State Lett.
, vol.7
-
-
Yen, J.-H.1
Leu, I.-C.2
Wu, M.-T.3
Lin, C.-C.4
Hon, M.-H.5
-
12
-
-
0141733188
-
-
Hwang S.-K., Jeong S.-H., Hwang H.-Y., Lee O.-J., and Lee K.-H. Korean J. Chem. Eng. 19 (2002) 467
-
(2002)
Korean J. Chem. Eng.
, vol.19
, pp. 467
-
-
Hwang, S.-K.1
Jeong, S.-H.2
Hwang, H.-Y.3
Lee, O.-J.4
Lee, K.-H.5
-
13
-
-
33748779997
-
-
Handbook of Chemistry and Physics, 79th ed. CRC Press, Chemical Rubber Company (1998) p. 12-191.
-
-
-
-
15
-
-
18744412941
-
-
Hwang S.-K., Lee J., Jeong S.-H., Lee P.-S., and Lee K.-H. Nanotechnology 16 (2005) 850
-
(2005)
Nanotechnology
, vol.16
, pp. 850
-
-
Hwang, S.-K.1
Lee, J.2
Jeong, S.-H.3
Lee, P.-S.4
Lee, K.-H.5
-
24
-
-
0000961126
-
-
Bonard J.-M., Salvetat J.-P., Stöckli T., de Heer W.A., Forró L., and Châtelain A. Appl. Phys. Lett. 73 (1998) 918
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 918
-
-
Bonard, J.-M.1
Salvetat, J.-P.2
Stöckli, T.3
de Heer, W.A.4
Forró, L.5
Châtelain, A.6
-
25
-
-
0032655482
-
-
Bonard J.-M., Salvetat J.-P., Stöckli T., Forró L., and Châtelain A. Appl. Phys., A 69 (1999) 245
-
(1999)
Appl. Phys., A
, vol.69
, pp. 245
-
-
Bonard, J.-M.1
Salvetat, J.-P.2
Stöckli, T.3
Forró, L.4
Châtelain, A.5
-
26
-
-
0001228383
-
-
Davydov D.N., Sattari P.A., AlMawlawi D., Osika A., Haslett T.L., and Moskovits M. J. Appl. Phys. 86 (1999) 3983
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 3983
-
-
Davydov, D.N.1
Sattari, P.A.2
AlMawlawi, D.3
Osika, A.4
Haslett, T.L.5
Moskovits, M.6
-
29
-
-
0002602876
-
-
Barbour J.P., Dolan W.W., Trolan J.K., Martin E.E., and Dyke W.P. Phys. Rev. 92 (1953) 45
-
(1953)
Phys. Rev.
, vol.92
, pp. 45
-
-
Barbour, J.P.1
Dolan, W.W.2
Trolan, J.K.3
Martin, E.E.4
Dyke, W.P.5
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