Nanofabrication of magnetic tunnel junctions by using electron beam lithography

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue III, 2004, Pages 1947-1948

  Niizeki, T ^a   Kubota, H ^a   Ando, Y ^a   Miyazaki, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ferromagnetic tunnel junction; Single electron tunneling; Tunnel magnetoresistance

Indexed keywords

COULOMB BLOCKADE; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; ELECTRON TUNNELING; MAGNETORESISTANCE; MULTILAYERS; NANOTECHNOLOGY;

FERROMAGNETIC TUNNEL JUNCTIONS; MICROFABRICATION; SINGLE-ELECTRON TUNNELLING; TUNNEL MAGNETORESISTANCE;

TUNNEL JUNCTIONS;

EID: 21044459961     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.387     Document Type: Conference Paper

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