van der Waals interaction in systems involving oxidised polystyrene surfaces

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 279, Issue 1-3, 2006, Pages 188-195

  Lubarsky, G V ^a   Mitchell, S A ^a   Davidson, M R ^a   Bradley, R H ^a  

^a ROBERT GORDON UNIVERSITY   (United Kingdom)

Author keywords

AFM; Dielectric permittivity; Hamaker constant; Polystyrene; Refractive index; van der Waals force

Indexed keywords

ATOMIC FORCE MICROSCOPY; NITROGEN; OXIDATION; PERMITTIVITY; REFRACTIVE INDEX; SILICON NITRIDE; SURFACE PROPERTIES; VAN DER WAALS FORCES;

HAMAKER CONSTANT; LIFSHITZ THEORY; OXYGEN CONCENTRATION; SPHERICAL SILICA PROBES;

POLYSTYRENES;

NITROGEN; OZONE; POLYSTYRENE; SILICON DIOXIDE; SILICON NITRIDE; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CALCULATION; CHEMICAL PROCEDURES; CHEMICAL REACTION; DIELECTRIC CONSTANT; PRIORITY JOURNAL; REFRACTION INDEX; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

EID: 33748658688     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2006.01.002     Document Type: Article

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