Thickness of silicon-nitride antireflective coating on a silicon waveguide measured by an integrated micromechanical gauge

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 2, 2006, Pages

  Tilleman, Ichael M ^a,b   Haronian, Dan ^a   Abraham, David ^a  

^a GalayOr Inc   (Israel)

^b Minuteman Group Inc   (United States)

Author keywords

Antireflective coating; Micro mechanical gauge; Silicon; Silicon nitride; Waveguides

Indexed keywords

MICRO-MECHANICAL GAUGE; SILICON-ON-INSULATOR (SOI) WAFERS; SUSPENDED WAVEGUIDES;

GAGES; LASER BEAMS; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; SILICON NITRIDE; SILICON WAFERS;

ANTIREFLECTION COATINGS;

EID: 33748575561     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2198815     Document Type: Article

References (14)

1. I. E. Day, I. Evans, A. P. Knights, G. F. Hopper, S. W. Roberts, J. Johnston, S. Day, B. J. Luff, H. K. Tsang, and M. Asghari, "Tapered silicon waveguides for low insertion loss highly-efficient high-speed electronic variable optical attenuators," Proc. Optical Fiber Commun. Conf. (OFC), Atlanta, GA (Mar. 2003).
2. W. Stutius and W. Streifer, "Silicon nitride films on silicon for optical waveguides," Appl. Opt. 16, 3218 (1977).
3. X. S. Wang, Z. Q. Li, L. Wang, G. Zhai, Y. Hu, K. K. Fung, J. C. Tang, and N. Cue, "Characterization of crystalline SiNx thin films on Si (111) and Ge overlayer growth," Jpn. J. Appl. Phys., Part 140, 4292-4298 (2001).
4. Y. Manabe and T. Mitsuyu, "Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method," J. Appl. Phys. 66(6), 2475-2480 (Sep. 1989).
5. J. Härkönen, T. Juvonen, K. Solehmainen, S. Jyrinki, J. Kylmäiuoma, and P. Kuivalainen, "Silicon solar cells," see http://www.hut.fi/Yksikot/Elfys/Research/res2000/Si_solar/Si_solar.html.
6. B. Gruska and S. Peters, "Fast and reliable thickness and refractive index measurement of antireflection coatings on solar silicon by ellipsometry," see http://www.sentech.com/applications/appl_solar.pdf.
7. J. Zhao, A. Wang, and M. A. Green, "Double layer antireflection coating for high efficiency passivated emitter solar cells," IEEE Trans. Electron Devices 41, 1592 (1994).
8. J. T. Rantala and A. H. O. Kärkkäinen, "Optical properties of spin-on deposited low temperature titanium oxide thin films, " Opt. Express 11, 1406 (2003).
9. W. H. Chuang, T. Luger, R. K. Fettig, and R. Ghodssi, "Mechanical property characterization of LPCVD silicon nitride thin films at cryogenic temperatures," J. Microelectromech. Syst. 13, 870 (2004).
10. D. R. Askeland, The Science and Engineering of Materials, 2nd ed., PWS-KENT, Boston (1989).
11. J. J. Vlassak and W. D. Nix, "A new bulge test technique for the determination of Young's modulus and Poisson's ratio of thin films," J. Mater. Res. 7(12), 3242-3249 (1992).
12. R. L. Edwards, G. Coles, and W. N. Sharpe, Jr., "Comparison of tensile and bulge tests for thin-film silicon nitride," Exp. Mech. 44, 49 (2004).
13. D. Maier-Schneider, A. Ersoy, J. Maibach, D. Schneider, and E. Obermeier, "Influence of annealing on elastic properties of LPCVD silicon nitride and LPCVD polysilicon," Sens. Mater. 7, 121 (1995).
14. H. J. Lee, C. H. Henry, K. J. Orlowsky, R. F. Kazarinov, and T. Y. Kometani, "Refractive-index dispersion of photosilicate glass, thermal oxide, and silicon nitride films on silicon," Appl. Opt. 27, 4104 (1988).