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Volumn 24, Issue 5, 2006, Pages 1914-1919

Surface kinetics modeling of silicon and silicon oxide plasma etching. II. Plasma etching surface kinetics modeling using translating mixed-layer representation

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION FLUX; COMPUTATION SPEED; MIXED LAYER MODEL; SURFACE KINETICS MODELING;

EID: 33748535489     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2336226     Document Type: Article
Times cited : (9)

References (16)
  • 16
    • 33748581521 scopus 로고    scopus 로고
    • Ph.D. thesis, Massachusetts Institute of Technology
    • W. Jin, Ph.D. thesis, Massachusetts Institute of Technology, 2004.
    • (2004)
    • Jin, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.