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Volumn 24, Issue 5, 2006, Pages 1914-1919
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Surface kinetics modeling of silicon and silicon oxide plasma etching. II. Plasma etching surface kinetics modeling using translating mixed-layer representation
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Author keywords
[No Author keywords available]
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Indexed keywords
ADSORPTION FLUX;
COMPUTATION SPEED;
MIXED LAYER MODEL;
SURFACE KINETICS MODELING;
COMPUTER SIMULATION;
DEPOSITION;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
SILICA;
SILICON;
SURFACE REACTIONS;
PLASMA ETCHING;
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EID: 33748535489
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2336226 Document Type: Article |
Times cited : (9)
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References (16)
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