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Volumn 90, Issue 18-19, 2006, Pages 3449-3455

The diffusion of hydrogen and inert gas in sputtered a-SiC:H alloys: Microstructure study

Author keywords

Amorphous films; Hydrogen effusion; SIMS; Sputtering

Indexed keywords

AMORPHOUS FILMS; ARGON; DIFFUSION; HYDROGEN; INERT GASES; MICROSTRUCTURE; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

EID: 33748463605     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2006.04.013     Document Type: Article
Times cited : (3)

References (16)
  • 1
    • 33846988425 scopus 로고    scopus 로고
    • Nickel N.H. (Ed), Academic Press, New York
    • Beyer W. In: Nickel N.H. (Ed). Hydrogen in Semiconductors vol. II (1999), Academic Press, New York 165
    • (1999) Hydrogen in Semiconductors , vol.II , pp. 165
    • Beyer, W.1
  • 3
    • 33748473302 scopus 로고    scopus 로고
    • J.F. Ziegler, J.P. Biersack, U. Littmark, The Stopping and Range of Ions in Solids, Pergamon, New York, 1985; TRIM 95.4, IBM Research, Yorktown, NY, 1995.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.