Anisotropic mesh refinement for the simulation of three-dimensional semiconductor manufacturing processes

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 25, Issue 10, 2006, Pages 2129-2138

  Wessner, Wilfried ^b   Cervenka, Johann ^b   Heitzinger, Clemens ^b   Hössinger, Andreas ^b   Selberherr, Siegfried ^a,b  

^a IEEE

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Anisotropy; Mesh refinement; Tetrahedral bisection; Tetrahedral meshes

Indexed keywords

ALGORITHMS; ANISOTROPY; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; FINITE ELEMENT METHOD; METRIC SYSTEM;

MESH REFINEMENT; TETRAHEDRAL BISECTION; TETRAHEDRAL MESHES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33748299420     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCAD.2005.862750     Document Type: Article

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