Error estimated driven anisotropic mesh refinement for three-dimensional diffusion simulation

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn 2003-January, Issue , 2003, Pages 109-112

  Wessner, W ^a   Heitzinger, C ^a   Hossinger A ^a   Selberherr, S ^a  

^a INSTITUTE FOR MICROELECTRONICS   (Austria)

Author keywords

Anisotropic magnetoresistance; Computational modeling; Error analysis; Extraterrestrial measurements; Microelectronics; Physics; Refining; Shape control; Spatial resolution; Telephony

Indexed keywords

ANISOTROPY; ENHANCED MAGNETORESISTANCE; ERROR ANALYSIS; ERRORS; IMAGE RESOLUTION; MICROELECTRONICS; PHYSICS; REFINING; SEMICONDUCTOR DEVICES;

COMPUTATIONAL MODEL; EXTRATERRESTRIAL MEASUREMENTS; SHAPE CONTROL; SPATIAL RESOLUTION; TELEPHONY;

MESH GENERATION;

EID: 33748335331     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SISPAD.2003.1233649     Document Type: Conference Paper

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