Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6281, Issue , 2006, Pages

  Gans, F ^a   Liebe, R ^a   Heins, Th ^a   Richter, J ^a   Hassler Grohne W ^b   Frase, C G ^b   Bodermann, B ^b   Czerkas, S ^b   Dirscherl, K ^b   Bosse, H ^b  

^a Advanced Mask Technology Center   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; Cross calibration; Edge profile; Sidewall angle; Signal modeling

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; COMPUTER SIMULATION; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

CD METROLOGY; CROSS CALIBRATION; EDGE PROFILE; SIDEWALL ANGLE; SIGNAL MODELING;

MASKS;

EID: 33748058486     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692736     Document Type: Conference Paper

References (16)

1. International Technology Roadmap for Semiconductors, http://public.itrs. net
2. R. Hoobler, P. Gise: "Mask metrology using OCD for profiling", Solid State Technology, April 2005, 35-38
3. B. Banke et al: Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology, Proc. SPIE 5375, 133-150, 2004
4. W. Häßler-Grohne, T. Dziomba, C.G. Frase, H. Bosse, J. Prochazka: Characterization of a 100 nm 1D pitch standard by metrological SEM and SFM, Proc. SPIE Microlithography, Vol. 5375, p. 426-436, 2004
5. W. Häßler-Grohne, H. Bosse, "Electron optical metrology system for pattern placement measurements", Meas. Sci. Technol. 9, 1120-1128 (1998)
6. L. Reimer, M. Kässens, L. Wiese, "Monte Carlo Program with free Configuration of Specimen Geometry and Detector Signals", Microchim. Acta 13, pp.485-492 (1996)
7. W. Mirandé, C.G. Frase, "Comparison of Linewidth Measurements on Si Structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM)", Proceedings Quantitative Microscopy (QM '99), Kopenhagen, 1999, PTB-Bericht PTB-F-34, 89-96 (1999)
8. C.G. Frase, W. Häßler-Grohne, ,E. Buhr, K. Hahm, H. Bosse: "Analysis and comparison of CD-SEM edge operators: a contribution to feature width metrology", Nanoscale Calibration Standards and methods, edited by G. Wilkening and L. Koenders, 2005, 385-403, (Conf. Proc. Nanoscale 2004)
9. U. Dersch et al.: Impact of EUV Mask Pattern Profile Shape on CD Measured by CD-SEM, Proc. of SPIE Vol. 5752, 2005, pp. 632-645
10. B. Bodermann, E. Buhr, W. Mirandé: "Quantitative Mikroskopie: Dimensionelle Messtechnik an Mikro- und Nanostrukturen", PTB Mitteilungen 113, 4, 9-17 (2003) (in German)
11. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings", JOSA A 12, (1995), 1068-1076
12. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach", JOSA A 12, (1995), 1077-1086
13. M. Totzeck: "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112, (2001), 399-406
14. http://www.wias-berlin.de/software/DlPOG
15. B. Bodermann, G. Ehret: "Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation", Proc. SPIE 5858-09, (2005)
16. F. Gans et al.: "Results of a round robin measurement on a new CD mask standard", Proc. 21st EMC, GMM-Fachbericht 45, (2005), 109-120