Mask metrology using: OCD for profiling

Solid State Technology

Volumn 48, Issue 4, 2005, Pages 35-38

  Hoobler, Ray ^a   Gise, Peter ^a  

^a NANOMETRICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFTER-DEVELOPMENT INSPECTION (ADI); AFTER-ETCH INSPECTION (AEI); OPTICAL CRITICAL-DIMENSION (OCD) METROLOGY; PHASE-SHIFT MASK (PSM);

ATOMIC FORCE MICROSCOPY; BROADBAND NETWORKS; DATA ACQUISITION; DIFFRACTION GRATINGS; ELECTRON BEAMS; ELLIPSOMETRY; MATHEMATICAL MODELS; PHASE SHIFT; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

MASKS;

EID: 17444430310     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (0)