Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5858, Issue , 2005, Pages 1-12

  Bodermann, Bernd ^a   Ehre, Gerd ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Linewidth; Microscopy; Photomask; Rigorous diffraction calculation

Indexed keywords

DIFFRACTION; FINITE ELEMENT METHOD; GLASS; IMAGING TECHNIQUES; LIGHTING; MASKS; MATHEMATICAL MODELS; OPTICAL VARIABLES MEASUREMENT; UNCERTAIN SYSTEMS;

LINEWIDTH; PHOTOMASK; RIGOROUS COUPLED WAVE ANALYSIS (RCWA); RIGOROUS DIFFRACTION CALCULATION;

OPTICAL MICROSCOPY;

EID: 28844435366     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.612632     Document Type: Conference Paper

References (13)

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