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Volumn E89-C, Issue 7, 2006, Pages 1031-1036

A mechanism of enhancement-mode operation of AlGaN/GaN MIS-HFET

Author keywords

AlGaN; Enhancement; GaN; HFET; Insulator; MIS

Indexed keywords

COMPUTER SIMULATION; ELECTRODES; GALLIUM NITRIDE; GATES (TRANSISTOR); HETEROJUNCTIONS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR MATERIALS; THRESHOLD VOLTAGE;

EID: 33747874579     PISSN: 09168524     EISSN: 17451353     Source Type: Journal    
DOI: 10.1093/ietele/e89-c.7.1031     Document Type: Conference Paper
Times cited : (4)

References (7)
  • 1
    • 0000349649 scopus 로고    scopus 로고
    • AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors on SiC substrates
    • Aug.
    • M.A. Kahn, X. Hu, A. Tarakji, G. Simin, J. Yang, R. Gaska, and M.S. Shur, "AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors on SiC substrates," Appl. Phys. Lett., vol.77, no.9, pp.1339-1341, Aug. 2000.
    • (2000) Appl. Phys. Lett. , vol.77 , Issue.9 , pp. 1339-1341
    • Kahn, M.A.1    Hu, X.2    Tarakji, A.3    Simin, G.4    Yang, J.5    Gaska, R.6    Shur, M.S.7
  • 4
    • 0141569703 scopus 로고    scopus 로고
    • Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors
    • July
    • T. Hashizume, S. Ootomo, T. Inagaki, and H. Hasegawa, "Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors," J. Vac. Sci. Technol. B, vol.21, no.4, pp.1828-1838, July 2003.
    • (2003) J. Vac. Sci. Technol. B , vol.21 , Issue.4 , pp. 1828-1838
    • Hashizume, T.1    Ootomo, S.2    Inagaki, T.3    Hasegawa, H.4
  • 6
    • 12344314332 scopus 로고    scopus 로고
    • High-voltage normally off GaN MOSFETs on sapphire substrates
    • Jan.
    • K. Matocha, T.P. Chow, and R.J. Gutmann, "High-voltage normally off GaN MOSFETs on sapphire substrates," IEEE Trans. Electron Devices, vol.52, no.1, pp.6-10, Jan. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.1 , pp. 6-10
    • Matocha, K.1    Chow, T.P.2    Gutmann, R.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.