Microstructures and dielectric properties of PZT thick films prepared by aerosol plasma deposition with microwave annealing

Materials Science and Engineering: B

Volumn 133, Issue 1-3, 2006, Pages 181-185

  Huang, C M ^a   Wang, S F ^a   Peng, C J ^b   Shieh, J ^c   Chang, C S ^b   Lin, T S ^b  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Aerosol plasma deposition; Microwave annealing; PZT; Thick films

Indexed keywords

AEROSOLS; ANNEALING; DEPOSITION; DIELECTRIC PROPERTIES; MICROWAVES; PERMITTIVITY; PLASMAS; SUBSTRATES;

AEROSOL PLASMA DEPOSITION (APD); MICROWAVE ANNEALING; PZT; ROOM TEMPERATURE;

THICK FILMS;

EID: 33747863271     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.06.033     Document Type: Article

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