A dispatching rule for photolithography scheduling with an on-line rework strategy

Computers and Industrial Engineering

Volumn 50, Issue 3, 2006, Pages 233-247

  Sha, D Y ^a,b   Hsu, S Y ^c   Che, Z H ^d   Chen, C H ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b ASIA UNIVERSITY   (Taiwan)

^c CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

^d NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Dispatching rule; Finished proportion; On line rework; Photolithography area

Indexed keywords

PHOTOLITHOGRAPHY; PRODUCTION CONTROL; SCHEDULING; WSI CIRCUITS;

DISPATCHING RULE; FINISHED PROPORTION; ON-LINE REWORK; PHOTOLITHOGRAPHY AREA;

ONLINE SYSTEMS;

EID: 33747781379     PISSN: 03608352     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cie.2006.04.002     Document Type: Article

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