Fabrication of large-area two-dimensional photonic crystals using interference lithography and direct writing of defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6182, Issue , 2006, Pages

  Baroni, Pierre Yves ^a   Scharf, Toralf ^a   Herzig, Hans Peter ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Direct writing fabrication; Nanostrucrure; Photonic crystals; Waveguides

Indexed keywords

DEFECTS; LITHOGRAPHY; PHOTORESISTS; PIEZOELECTRICITY; PLASMA ETCHING; SILICON WAFERS;

DIRECT WRITING FABRICATION; GLASS WAFER SUBSTRATE; PHOTONIC CRYSTALS;

PHOTONS;

EID: 33747698450     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.661921     Document Type: Conference Paper

References (25)

1. Aastuen D J W, C.L.K., Clark N A, Ackerson B, Nucleation and Growth of Colloidal Crystals. Phys. Rev. Letters, 1986. 57(14): p. 1733-1736.
2. de Dood MJA, P.A., Zijlstra T, van der Drift EWJM, Amorphous silicon waveguides for microphotonics. JOURNAL OF APPLIED PHYSICS, 2002. 92(2): p. 649-653.
3. Summers CJ, N.C., Park W, Activephotonic crystal nano-architectures. JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, 2003. 12(4): p. 587-597.
4. Lin SY, F. J., Lin R, Sigalas MM, Biswas R, Ho KM, Complete three-dimensional photonic bandgap in a simple cubic structure. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2001. 18(1): p. 32-35.
5. ChowE, L.S., Johnson SG, Villeneuve PR, Joannopoulos JD, Wendt JR, Vawter GA, Zubrzycki W, Hou H, Alleman A, Three-dimensional control of light in a two-dimensional photonic crystal slab. NATURE, 2000. 407(6807): p. 983-986.
6. Birner A, W.R., Gosele UM, Busch K, Silicon-based photonic crystals. ADVANCED MATERIALS, 2001. 13(6): p. 377-388.
7. WENDT JR, V.G., GOURLEY PL, BRENNAN TM, HAMMONS BE, NANOFABRICA TION OF PHOTONIC LATTICE STRUCTURES IN GAAS/ALGAAS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993. 11(6): p. 2637-2640.
8. GOURLE Y PL, W. J., VAWTER GA, BRENNAN TM, HAMMONS BE, OPTICAL-PROPERTIES OF 2-DMENSIONAL PHOTONIC LATTICES FABRICATED AS HONEYCOMB NANOSTRUCTURES IN COMPOUND SEMICONDUCTORS. APPLIED PHYSICS LETTERS, 1994. 64(6): p. 687-689.
9. Cheng CC, S.A., Fabrication of photonic band-gap crystals. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995. 13(6): p. 2696-2700.
10. Wendt JR, V.G., Smith RE, Warren ME, Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995. 13(6): p. 2705-2708.
11. Cheng CC, AV., Scherer A. Yablonovitch E, Nanofabricated three dimensional photonic crystals operating at optical wavelengths. PHYSICA SCRIPT A, 1996. T68::p. 17-20 1996.
12. Cheng CC, S.A., ArbetEngels V, Yablonovitch E, Lithographic bandgap tuning in photonic bandgap crystals. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996. 14(6): p. 4110-4114.
13. Cheng CC, S.A., Tyan RC. Fainman Y, Witzgall G, Yablonovitch E, New fabrication techniques for high quality photonic crystals. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997. 15(6): p. 2764-2767.
14. Dial O, C.C., Scherer A, Fabrication of high-density nanostructures by electron beam lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998. 16(6): p. 3887-3890.
15. Poborchii VV, T.T., Kanayama T, A visible-near infrared range photonic crystal made up of Si nanopillars. APPLIED PHYSICS LETTERS, 1999. 75(21): p. 3276-3278.
16. Zijlstra T, v.d.D.E., de Dood MJA, Snoeks E, Polman A, Fabrication of two-dimensional photonic crystal waveguides for 1.5 mu m in silicon by deep anisotropic dry etching. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999. 17(6): p. 2734-2739.
17. Tada T. P. V., Kanayama T, Channel waveguides fabricated in 2D photonic crystals of Si nanopillars. MICROELECTRONIC ENGINEERING, 2002. 63(1-3): p. 259-265.
18. Poborchii VV, T.T., Kanayama T, Moroz A, Silver-coated silicon pillar photonic crystals: Enhancement of a photonic bandgap. APPLIED PHYSICS LETTERS, 2003. 82(4): p. 508-510.
19. Pang L., Nakagawa W., Fainman Y., fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching. OPTICAL ENGINEERING, 2003, 42(10): p. 2912-2917.
20. Pustai D. M., Sharkawy A., Shi S., Jin G., Murakowski J., Prather D. W., Characterisation and analysis of photonic crystal coupled waveguides. JOURNAL OF MICROLITHOGRAPHY, MICROFABRICATION AND MICROSYSTEMS, 2003. 2(4): p. 292-299.
21. Lin S. Y., Chow E., Bur J., Johnson S. G., Joannopoulos J. D., Low-loss, wide angle Y splitter at ∼1.6-μm wavelengths built with a two-dimensional photonic crystal. OPTICS LETTERS, 2002. 27(16): p. 1400-1402.
22. Sun H.-B., Nakamura A., Kaneko K., Shoji S., Direct laser writing defects in holographic lithography-created photonic lattices. OPTICS LETTERS, 2005, 30(8): p. 881-883.
23. Pang L., Nakagawa W., Fainman Y., Fabricatio of two-dimensional photonic crystals with controlled defects by use of mutliple exposures and direct write. APPLIED OPTICS, 2003, 42(27); p. 5450-5456.
24. Ashraf H., Bhardwaj J.K., Hall S., Guibarra E.,Hopkins J., Hynes A.M., Johnston L, Lea L. Mccauley S., Nicholls G., O'brien P., Defining conditions for the etching of silicon in an inductive coupled plasma reactor. SURFACE TECHNOLOGY SYSTEMS LTD.
25. http://www.stsystems.com/pages/process_content.asp?menuID=37&subID= 54&menuTitle=Technologies&mainMenuTitle=Products%20~%20Applications