Nanofabricated three dimensional photonic crystals operating at optical wavelengths

Physica Scripta T

Volumn 68, Issue , 1996, Pages 17-20

  Cheng, C C ^a   Arbet Engels, V ^b   Scherer, A ^a   Yablonovitch, E ^b  

^a California Institute of Technology   (United States)

^b Engineering IV   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; ELECTRON BEAM LITHOGRAPHY; ENERGY GAP; ETCHING; FABRICATION; ION BEAMS; NANOTECHNOLOGY; PHOTONS; QUANTUM OPTICS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE STRUCTURES; THREE DIMENSIONAL;

BANDGAP; ELECTROMAGNETIC SPECTRA; FIGURE OF MERIT; ION BEAM ETCHING; MICROWAVE FREQUENCY; NANO SCALE; OPTICAL REFLECTIVITY; OPTICAL WAVELENGTH; PHOTONIC CRYSTAL;

CRYSTALS;

EID: 0030410274     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1088/0031-8949/1996/t68/002     Document Type: Article

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