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Volumn 85, Issue 1, 2006, Pages 1-6

Growth and characterization of indium phosphide single-crystal nanoneedles on microcrystalline silicon surfaces

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; EPITAXIAL GROWTH; GOLD; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33747487070     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-006-3663-4     Document Type: Article
Times cited : (39)

References (21)
  • 8
    • 33747494714 scopus 로고    scopus 로고
    • The InP growth was performed by Spire Bandwidth Semicon., LLC (Hudson, NH, USA), under contract to Hewlett-Packard
    • The InP growth was performed by Spire Bandwidth Semicon., LLC (Hudson, NH, USA), under contract to Hewlett-Packard


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.