Chromium and nickel substituted iron oxide thin films by DC sputtering

Vacuum

Volumn 81, Issue 1, 2006, Pages 133-137

  Kiran, M S R N ^a   Sudheendran, K ^a   Ghanashyam Krishna, M ^a   James Raju, K C ^a   Bhatnagar, Anil K ^a  

^a UNIVERSITY OF HYDERABAD   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; IRON OXIDES; PERMITTIVITY; REFRACTIVE INDEX; SILICATES; SPUTTERING; SUBSTITUTION REACTIONS; SURFACE ROUGHNESS;

DC SPUTTERING; MICROWAVE DIELECTRIC CONSTANT; QUARTZ SUBSTRATES; SPUTTERING PRESSURE;

THIN FILMS;

EID: 33747485618     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.01.014     Document Type: Article

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