a-axis oriented Bi4Ti3O12 thin films deposited on Si(111) by femtosecond laser ablation

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 33, Issue 6, 2006, Pages 832-836

  Zhou, You Hua ^a,b   Zheng, Qi Guang ^a   Yang, Guang ^a   Dai, Neng Li ^a   Lu, Pei Xiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b JIANGHAN UNIVERSITY   (China)

Author keywords

Bi4Ti3O12; Femtosecond; Ferroelectric film; Pulsed laser deposition; Thin film

Indexed keywords

COERCIVE FORCE; CRYSTALLINE MATERIALS; FERROELECTRIC DEVICES; FERROELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; MORPHOLOGY; PIEZOELECTRIC DEVICES; POLARIZATION; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; QUARTZ; REFLECTION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACES; X RAY DIFFRACTION ANALYSIS;

CRYSTALLOGRAPHIC ORIENTATION; FEMTOSECOND; FERROELECTRIC FILM; FIELD SCANNING ELECTRON MICROSCOPE (FSEM); OPTICAL FORBIDDEN GAP; SPONTANEOUS POLARIZATION; STORAGE DEVICES;

THIN FILMS;

EID: 33746814031     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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