The ultrafast excitation processes in femtosecond laser-induced damage in dielectric omnidirectional reflectors

Journal of Applied Physics

Volumn 100, Issue 2, 2006, Pages

  Jia, T Q ^a,b   Sun, H Y ^b   Li, X X ^b   Feng, D H ^b   Li, C B ^b   Xu, S Z ^b   Li, R X ^b   Xu, Z Z ^b   Kuroda, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AVALANCHE DIODES; DIELECTRIC PROPERTIES; ELECTRIC EXCITATION; LASER PULSES; OPTICAL PUMPING; PHOTOIONIZATION; PROBES; SILICA; TITANIUM DIOXIDE;

AVALANCHE IONIZATION (AI); PROBE SYSTEMS; PUMP PULSE ENERGY; ULTRAFAST EXCITATION;

MIRRORS;

EID: 33746805358     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2215217     Document Type: Article

References (63)

1. D. Du, X. Liu, G. Korn, J. Squier, and G. Mourou, Appl. Phys. Lett. 64, 3071 (1994);
2. A. Tien, S. Backus, H. Kapteyn, M. Murmane, and G. Mourou, Phys. Rev. Lett. 82, 3883 (1999).
3. B. Stuait, M. Feit, S. Herman, A. Rubenchik, B. Shore, and M. Perry, Phys. Rev. Lett. 74, 2248 (1995);
4. Phys. Rev. B 53, 1749 (1996);
5. J. Opt. Soc. Am. B 13, 459 (1996).
6. T. Jia, Z. Xu, X. Li, R. Li, B. Shuai, and F. Zhao, Appl. Phys. Lett. 82, 4382 (2003);
7. J. Appl. Phys. 95, 5166 (2004);
8. Appl. Phys. A: Mater. Sci. Process. 81, 645 (2005).
9. M. Lenzner, J. Kruger, S. Sartania, Z. Chen, C. Spielmann, G. Mourou, W. Kautek, and F. Krausz, Phys. Rev. Lett. 80, 4076 (1998);
10. Appl. Phys. Lett. 69, 3146 (1996).
11. M. Mero, J. Liu, W. Rudolph, D. Ristau, and K. Starke, Phys. Rev. B 71, 115109 (2005).
12. X. Li, T. Jia, D. Feng, and Z. Xu, Appl. Surf. Sci. 225, 339 (2004).
13. S. Xu et al., Jpn. J. Appl. Phys., Part 1 44, 8201 (2005).
14. J. Jasapara, A. Nampoothiri, W. Rudolph, D. Ristau, and K. Starke, Phys. Rev. B 63, 045117 (2001).
15. D. Linde and H. Schuler, J. Opt. Soc. Am. B 13, 216 (1996);
16. K. SoKolowski-Tinten, J. Solis, J. Bialkowski, J. Siegel, C. Afonso, and D. Linde, Phys. Rev. Lett. 81, 3679 (1998).
17. R. Stoian, A. Rosenfeld, D. Ashkenasi, I. Hertel, N. Bulgakova, and E. Campbell, Phys. Rev. Lett. 88, 097603 (2002);
18. Phys. Rev. B 62, 13167 (2000).
19. K. Miura, J. Qiu, S. Fujiwara, S. Sakaguchi, and K. Hirao, Appl. Phys. Lett. 80, 2263 (2002).
20. D. Simanovskii, H. Schwettman, H. Lee, and A. Welch, Phys. Rev. Lett. 91, 107601 (2003).
21. I. Chowdhury, X. Xu, and A. Weiner, Appl. Phys. Lett. 86, 151110 (2005).
22. S. Mao, F. Quere, S. Guizard, X. Mao, R. Russo, G. Petite, and P. Martin, Appl. Phys. A: Mater. Sci. Process. 79, 1695 (2004).
23. A. Ben-Yakar and R. Byer, J. Appl. Phys. 96, 5316 (2004).
24. S. Vatsya, C. Li, and S. Nikumb, J. Appl. Phys. 97, 034912 (2005).
25. S. Henley, G. Fuge, and M. Ashfold, J. Appl. Phys. 97, 023304 (2005).
26. M. Sakakura and M. Terazima, Phys. Rev. B 71, 024113 (2005).
27. Y. Shimotsuma, P. Kazansky, J. Qiu, and K. Hirao, Phys. Rev. Lett. 91, 247405 (2003).
28. Y. Cheng, K. Sugioka, K. Midorikawa, M. Masuda, K. Toyoda, M. Kawachi, and K. Shihoyama, Opt. Lett. 28, 1144 (2003).
29. J. Natoli, B. Bertussi, and M. Commandre, Opt. Lett. 30, 1315 (2005).
30. C. Cheng and X. Xu, Phys. Rev. B 72, 165415 (2005).
31. O. Efimov, S. Juodkazis, and H. Misawa, Phys. Rev. A 69, 042903 (2004).
32. M. Li, S. Menon, J. Nibarger, and G. Gibson, Phys. Rev. Lett. 82, 2394 (1999).
33. N. Bulgakova, R. Stain, A. Rosenfeld, I. Hertel, and E. Campbell, Phys. Rev. B 69, 054102 (2004).
34. L. Sudrie, A. Couairon, M. France, B. Lamouroux, B. Prade, S. Tzortzakis, and A. Mysyrowicz, Phys. Rev. Lett. 89, 186601 (2002);
35. Phys. Rev. B 71, 125435 (2005).
36. A. Kaiser, B. Rethfeld, M. Vicanek, and G. Simon, Phys. Rev. B 61, 11437 (2000).
37. B. Rethfeld, Phys. Rev. Lett. 92, 187401 (2004).
38. F. Quéré, S. Guizard, and P. Martin, Europhys. Lett. 56, 138 (2001).
39. S. Guizard, A. Semerok, J. Gaudin, M. Hashida, P. Martin, and F. Quéué, Appl. Surf. Sci. 186, 364 (2002).
40. P. Audebert et al., Phys. Rev. Lett. 73, 1990 (1994).
41. H. Lee and T. Yao, J. Appl. Phys. 93, 819 (2003).
42. Y. Fink, J. Winn, S. Fan, C. Chen, J. Michel, J. Joannopoulos, and E. Thomas, Science 282, 1679 (1998).
43. C. Yamanaka, Proc. SPIE 3889, 2 (2000);
44. K. Tanaka et al., Phys. Plasmas 10, 1925 (2003).
45. F. Quéré, S. Guizard, P. Martin, G. Petite, O. Gobert, P. Meynadier, and M. Perdrix, Appl. Phys. B: Lasers Opt. 68, 459 (1999).
46. T. Polack, J. Ogilvie, S. Franzen, M. Vos, M. Joffre, J. Martin, and A. Alexandrou, Phys. Rev. Lett. 93, 018102 (2004).
47. O. Beyer, D. Maxein, K. Buse, B. Sturman, H. T. Hsieh, and D. Psaltis, Opt. Lett. 30, 1366 (2005).
48. O. Korovyanko, C. Sheng, Z. Vardeny, A. Dalton, and R. Baughman, Phys. Rev. Lett. 92, 017403 (2004).
49. F. Femandez-Alonso, M. Righini, A. Franco, and S. Selci, Phys. Rev. B 67, 165328 (2000).
50. D. Arnold and E. Cartier, Phys. Rev. B 46, 15102 (1992).
51. T. Jia, H. Chen, and Y. Zhang, Phys. Rev. B 61, 16522 (2000).
52. L. Keldysh, Sov. Phys. JETP 20, 1307 (1965).
53. G. Kaye and T. Laby, Tables of Physical and Chemical Constants (Longman, New York, 1986).
54. T. Jia, R. Li, Z. Liu, and Z. Xu, Appl. Phys. A: Mater. Sci. Process. 74, 503 (2002).
55. C. Li et al., Chin. Phys. 55, 217 (2006);
56. Proc. SPIE 6028, 377 (2005).
57. K. Sokolowski-Tinten and D. Linde, Phys. Rev. B 61, 2643 (2000).
58. E. Cartier and F. McFeely, Phys. Rev. B 44, 10689 (1991).
59. Q. Sun, H. Jiang, Y. Liu, Z. Wu, H. Yang, and Q. Gong, Opt. Lett. 30, 320 (2005).
60. T. Jia, H. Chen, H. Li, R. Li, and Z. Xu, Phys. Rev. A 64, 043811 (2001).
61. P. Daguzan, P. Martin, S. Guizard, and G. Petie, J. Appl. Phys. 52, 17099 (1995).
62. D. Linde, K. Sokolowski-Tinten, and J. Bialkowski, Appl. Surf. Sci. 109, 1 (1997).
63. C. Ziener, P. Foster, E. Divall, C. Hooker, M. Hutchinson, A. Langley, and D. Neely, J. Appl. Phys. 93, 768 (2003).