Molecular Vapor Deposition (MVD™) - A new method of appling moisture barriers for packaging applications

Proceedings of the International Symposium and Exhibition on Advanced Packaging Materials Processes, Properties and Interfaces

Volumn 2005, Issue , 2005, Pages 136-138

  Wanebo, Mike ^a   Kobrin, Boris ^a   Helmrich, Fred ^a   Chinn, Jeff ^a  

^a Applied Microstructures Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOISTURE INDUCED CORROSION; MOLECULAR VAPOR DEPOSITION; PACKAGING APPLICATIONS; PLASTIC PACKAGING;

CORROSION; HYDROPHOBICITY; MOISTURE; PACKAGING MATERIALS; PLASTIC FILMS; PLASTICS APPLICATIONS; VAPOR DEPOSITION;

ELECTRONICS PACKAGING;

CORROSION; DEPOSITION; MOISTURE; PACKAGING; PLASTICS; WATER REPELLENCE;

EID: 33746566536     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISAPM.2005.1432063     Document Type: Conference Paper

References (4)

1. Molecular Vapor Deposition (MVD) is a trademark of Applied MicroStructures, Inc.
2. W. R. Ashurst, C. Yau, C. Carraro, R. Maboudian, M. T. Dugger, "Dichlorodimethylsilane as an anti-stiction monolayer for MEMS: a comparison to the octadecyltrichlorosilane self-assembled monolayer", J. Microelectromechanical Systems, 10, 41-49, 2001.
3. T. M. Mayer, M.P. de Boer, N.D. Shinn, P.J. Clews, "Chemical vapor deposition of fluoroalkylsilane monolayer films", J. Vac. Sci. Technol. (B), 18, 2433-2440, 2000.
4. W. R. Ashurst, C. Carraro, R. Maboudian, W. Frey, "Wafer level antistiction coatings for MEMS", Sensors and Actuators (A), 104, 213-221, 2003.