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Volumn 2005, Issue , 2005, Pages 771-774

Monolithic integration of enhancement- And depletion-mode AlGaN/GaN HEMTs for GaN digital integrated circuits

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM GALLIUM NITRIDE; ELECTRIC POTENTIAL; HIGH ELECTRON MOBILITY TRANSISTORS; LOGIC CIRCUITS; MONOLITHIC INTEGRATED CIRCUITS; OSCILLATORS (ELECTRONIC);

EID: 33746514769     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (22)

References (9)
  • 1
    • 0032595863 scopus 로고    scopus 로고
    • Evaluation of the Temperature Stability of AlGaN/GaN Heterostructure FET's
    • Sep
    • I. Daumiller, C. Kirchner, M. Kamp, K. J. Ebeling, and E. Kohn, "Evaluation of the Temperature Stability of AlGaN/GaN Heterostructure FET's", IEEE Electron Device Lett., vol. 20, No. 9, pp. 448-450, Sep. 1999.
    • (1999) IEEE Electron Device Lett , vol.20 , Issue.9 , pp. 448-450
    • Daumiller, I.1    Kirchner, C.2    Kamp, M.3    Ebeling, K.J.4    Kohn, E.5
  • 2
    • 0038426995 scopus 로고    scopus 로고
    • High-temperature electronics - a role for wide bandgap semiconductors?
    • Jun
    • Neudeck, P.G., Okojie, R.S., Liang-Yu Chen,"High-temperature electronics - a role for wide bandgap semiconductors?", Proceedings of the IEEE, Vol 90, pp. 1065 -1076, Jun 2002.
    • (2002) Proceedings of the IEEE , vol.90 , pp. 1065-1076
    • Neudeck, P.G.1    Okojie, R.S.2    Chen, L.3
  • 3
    • 0035279863 scopus 로고    scopus 로고
    • Characterizations of Recessed Gate AlGaN/GaN HEMTs on Sapphire
    • Mar
    • T. Egawa, G. Y. Zhao, H. Ishikawa, M. Umeno, and T. Jimbo, "Characterizations of Recessed Gate AlGaN/GaN HEMTs on Sapphire", IEEE Trans. Electron Devices, Vol. 48, No. 3, pp. 603-608, Mar. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.48 , Issue.3 , pp. 603-608
    • Egawa, T.1    Zhao, G.Y.2    Ishikawa, H.3    Umeno, M.4    Jimbo, T.5
  • 9
    • 22944461728 scopus 로고    scopus 로고
    • High-Performance Enhancement-Mode AlGaN/GaN HEMTs using Fluoride-based Plasma Treatment
    • Y. Cai, Y. G. Zhou, K. J. Chen, and K. M. Lau,"High-Performance Enhancement-Mode AlGaN/GaN HEMTs using Fluoride-based Plasma Treatment," IEEE Electron Device Lett., vol. 26, no. 7, pp. 435-437, 2005.
    • (2005) IEEE Electron Device Lett , vol.26 , Issue.7 , pp. 435-437
    • Cai, Y.1    Zhou, Y.G.2    Chen, K.J.3    Lau, K.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.