SCOPUS 정보 검색 플랫폼

Volumn 9, Issue 9, 2006, Pages

Effects of nitrogen concentration on structural and electrical properties of titanium nitride for thin-film resistor applications

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); ELECTRIC PROPERTIES; ELECTRODIALYSIS; MAGNETRON SPUTTERING; NITROGEN; SUBSTRATES; TITANIUM NITRIDE;

FLOW RATIOS; RADIO FREQUENCY; ROOM TEMPERATURE; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR);

THIN FILM CIRCUITS;

EID: 33746507942 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2216592 Document Type: Article

Times cited : (12)

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