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Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 3, Issue , 2006, Pages 1491-1494

Growth of AlN films and their characterization

(10) Jain, Rakesh B a Gao, Ying a Zhang, Jianping a Fareed, R S Qhaleed a Gaska, Remis a Li, Jiawei b Arjunan, Arulchakkravarthi b Kuokstis, Edmundas c Yang, Jinwei b Khan, M Asif b

a SENSOR ELECTRONIC TECHNOLOGY INC (United States)

b The Department of Mechanical Engineering (United States)

c VILNIUS UNIVERSITY (Lithuania)

Author keywords

[No Author keywords available]

Indexed keywords

ALN FILMS; HYDRIDE VAPOR PHASE EPITAXY (HVPE); NOMARSKI MICROSCOPY; X-RAY ROCKING; 68.55.JK; 78.55.CR; 81.05.EA; 81.15.KK; FULL WIDTH HALF MAXIMUM; HIGH-RESOLUTION X-RAY DIFFRACTOMETRY; HYDRIDE VAPOR PHASE EPITAXY; MIGRATION-ENHANCED METAL ORGANIC CHEMICAL VAPOR DEPOSITIONS;

ATOMIC FORCE MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; THIN FILMS; VAPOR PHASE EPITAXY; WAVEFORM ANALYSIS; X RAY DIFFRACTION; THICK FILMS;

ALUMINUM NITRIDE; VAPORS;

EID: 33746341178 PISSN: 18626351 EISSN: None Source Type: Journal
DOI: 10.1002/pssc.200565371 Document Type: Conference Paper

Times cited : (8)

References (8)

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