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Volumn 6, Issue 2, 2004, Pages 2233-2236

Ion density distribution in an inductively coupled plasma chamber

Author keywords

Angmuir probe; Inductively coupled plasma; Ion density distribution

Indexed keywords

ELECTRIC POWER SYSTEMS; IONS;

EID: 33746340567     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/6/2/009     Document Type: Article
Times cited : (10)

References (7)
  • 1
    • 0010695332 scopus 로고    scopus 로고
    • Electron energy control in an inductively coupled plasma at low pressure
    • Haruo Shindo, Tkuya Urayama, Takashi Fujili. Electron energy control in an inductively coupled plasma at low pressure. Appl. Phys. Lett., 2000, 76(10): 1246-1248
    • (2000) Appl. Phys. Lett. , vol.76 , Issue.10 , pp. 1246-1248
    • Shindo, H.1    Urayama, T.2    Fujili, T.3
  • 2
    • 33746330850 scopus 로고
    • Chinese Science and Technology University Press, (in Chinese)
    • Zhao Huaqiao. Plasma Chemistry and Techniques Chinese Science and Technology University Press, 1993, 29 (in Chinese)
    • (1993) Plasma Chemistry and Techniques , pp. 29
    • Zhao, H.1
  • 3
    • 0035839930 scopus 로고    scopus 로고
    • Electron temperature analysis of tow-gas-species inductively coupled plasma
    • Bai K H, Chang H Y. Electron temperature analysis of tow-gas-species inductively coupled plasma. Appl Phys. Lett., 2001, 79(11): 1596-1598
    • (2001) Appl Phys. Lett. , vol.79 , Issue.11 , pp. 1596-1598
    • Bai, K.H.1    Chang, H.Y.2
  • 4
    • 33746338684 scopus 로고    scopus 로고
    • Numerical investigation on the flow and temperature fields in an inductively coupled plasma reactor
    • Wu Bin, Lin Lie, Zhang Xiejie, et al. Numerical investigation on the flow and temperature fields in an inductively coupled plasma reactor. Plasma Science & Technology, 2000, 2(6): 565-571
    • (2000) Plasma Science & Technology , vol.2 , Issue.6 , pp. 565-571
    • Wu, B.1    Lin, L.2    Zhang, X.3
  • 5
    • 33746330550 scopus 로고
    • Chinese TsingHua University Press, (in Chinese)
    • Zhen Hansheng. The Technology of Plasma Process. Chinese TsingHua University Press, 1990: 64-66 (in Chinese)
    • (1990) The Technology of Plasma Process , pp. 64-66
    • Zhen, H.1
  • 6
    • 0035334040 scopus 로고    scopus 로고
    • Stabilizing inductively plasma source impedance and plasma uniformity using a faraday shield
    • Marwan H Khater, Lawrence J Overzet. Stabilizing inductively plasma source impedance and plasma uniformity using a faraday shield. J. Vac. Sci. Technol, 2001, 19: 785-791
    • (2001) J. Vac. Sci. Technol , vol.19 , pp. 785-791
    • Khater, M.H.1    Overzet, L.J.2
  • 7
    • 0010695332 scopus 로고    scopus 로고
    • Electron energy control in an inductively coupled plasma at low pressure
    • Haruo Shindo, Tkuya Urayama, Takashi Fujili. Electron energy control in an inductively coupled plasma at low pressure, Appl. Phys. Lett., 2000, 76(10): 1246-1248
    • (2000) Appl. Phys. Lett. , vol.76 , Issue.10 , pp. 1246-1248
    • Shindo, H.1    Urayama, T.2    Fujili, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.