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Volumn 3, Issue , 2006, Pages 2299-2302
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Fabrication and characterization of Ni-based Schottky-type Al xGa1-xN ultraviolet photodetectors with different buffer conditions
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL QUALITY;
NI-BASED SCHOTTKY;
OPTO-ELECTRICAL PROPERTIES;
SPECIFIC DETECTIVITY;
73.40.KP;
78.55.CR;
81.15.KK;
85.60.DW;
FABRICATION AND CHARACTERIZATIONS;
SAPPHIRE SUBSTRATES;
ULTRA-VIOLET PHOTODETECTORS;
ELECTRIC CURRENTS;
EPITAXIAL GROWTH;
GALLIUM NITRIDE;
HETEROJUNCTIONS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SCHOTTKY BARRIER DIODES;
ULTRAVIOLET DETECTORS;
ALUMINUM;
ELECTRIC PROPERTIES;
NICKEL;
PHOTODETECTORS;
PHOTONS;
SAPPHIRE;
SEMICONDUCTING ALUMINUM COMPOUNDS;
GALLIUM ALLOYS;
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EID: 33746332662
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200565287 Document Type: Conference Paper |
Times cited : (2)
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References (7)
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