Preparation of β-FeSi2 films by chemical vapor deposition

Thin Solid Films

Volumn 381, Issue 2, 2001, Pages 214-218

  Mukaida, Masakazu ^a   Hiyama, Isao ^b   Tsunoda, Tatsuo ^a   Imai, Yoji ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; SEEBECK EFFECT; SEMICONDUCTING SILICON COMPOUNDS; SILANES;

FERROCENES; HIGH-FREQUENCY INDUCTION THERMAL CHEMICAL VAPOR DEPOSITION; TETRAMETHYLSILANES;

SEMICONDUCTING FILMS;

EID: 0035156315     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01746-6     Document Type: Article

References (9)

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