Method to improve the resolution of contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 241-254

  Kunkel, Gerhard ^a   Ziebold, Ralf ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Contact hole; Embedded attenuated phase shift mask; Resolution enhancement technology; Rim type phase shift mask

Indexed keywords

COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; DIFFRACTION; FOURIER TRANSFORMS; MASKS; MATHEMATICAL MODELS; PARAMETER ESTIMATION; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; VISUALIZATION;

CONTACT HOLES; EMBEDDED ATTENUATED PHASE-SHIFT MASK; RESOLUTION ENHANCEMENT TECHNOLOGY; RIM-TYPE PHASE-SHIFT MASK;

PHOTOLITHOGRAPHY;

EID: 3843094822     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535246     Document Type: Conference Paper

References (7)

1. B.J. Lin, "The attenuated phase-shifting mask," Solid State Technology, Vol. 35 No.1, pp. 43 (1992), T. Terasawa, N. Hasegawa, H. Fukuda, S. Katagari, "Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks," Jpn. J. Appl. Phys., Series 5, pp.3 (1991).
2. B.J. Lin, "The attenuated phase-shifting mask," Solid State Technology, Vol. 35 No.1, pp. 43 (1992), T. Terasawa, N. Hasegawa, H. Fukuda, S. Katagari, "Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks," Jpn. J. Appl. Phys., Series 5, pp.3 (1991).
3. F. Schellenberg, M. Levenson, P. Brock, "Optimization of Real Phase Mask Performance," Proc. SPIE, 1604, pp. 274-296, 1991.
4. P. Gräupner et al., "Solutions for printing sub 100nm contacts with ArF," Proc. SPIE, 4691, 2002.
5. th (expanded) Ed.(Pergamon Pres, Campridge, 1999) p. 440.
6. See, for example, J. Goodmann, Introduction to Fourier Optics (McGraw Hill, San Francisco, 1968) pp.63-65.
7. Y. Yanagishita, N. Ishiwata, Y. Tabata, K. Nakagawa, K. Shigematsu, "Phase-shifting Photolithography Applicable to Real IC Patterns," Proc. SPIE, 1463, 207 (1991).