Use of optical defocus components to investigate and improve pattern spatial frequency characteristics for more robust layouts

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2631-2635

  Melvin III, Lawrence S ^a   Shiely, James P ^a   Yan, Qiliang ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFOCUS FILTERS; GEOMETRIC RULES; MANUFACTURING PROPERTY;

COMPUTER SIMULATION; CONSTRAINT THEORY; DIFFRACTION; MATHEMATICAL MODELS; ROBUSTNESS (CONTROL SYSTEMS);

OPTICAL MATERIALS;

EID: 29044441880     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062687     Document Type: Article

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