Influence of mask induced polarization effects on a pattern printability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 576-586

  Aksenov, Yuri ^a   Dirksen, Peter ^a   Wei, Xiuhong ^a   Zandbergen, Peter ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

High NA; Mask topography; Optical lithography; Polarization; Process latitudes

Indexed keywords

ASPECT RATIO; DIFFRACTION; IMAGE ANALYSIS; LIGHT POLARIZATION; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; ROADS AND STREETS;

ARF IMMERSION LITHOGRAPHY; HIGH NA; MASK TOPOGRAPHY; PROCESS LATITUDES;

MASKS;

EID: 25144474417     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.597438     Document Type: Conference Paper

References (10)

1. B. Smith, J. Cashmore, "Challenges in High NA, Polarizations, and Photoresists," proc. SPIE, vol. 4691, p.11-24, 2002
2. M. Born, E. Wolf, Principles of optics, Pergamon press, 1980
3. A. Estroff, Y. Fan, A. Bourov, F. Cropanese, N. Lafferty, L. Zavyalova, B. Smith, "Mask induced polarization", proc. SPIE, vol. 5377, p.1069-1080, 2004.
4. N.Cobb, A.Zakhor, "Mathematical and CAD framework for proximity correction", proc. SPIE, vol.2726, p.208- 221, 1996
5. M. Brok and H.P. Urbach, "Rigorous model of the scattering of a focused spot by a grating and its application in optical recording, J.O.S.A. A, Vol. 20, No. 2, p. 256-273, 2003
6. X. Wei, H.P. Urbach, Y.Aksenov, A.J. Wachters, "Three-dimensional rigorous simulation of mask induced polarization ", proc.SPIE, 5754-53, 2005
7. Eugene Hecht, Optics, Addison Wesley, 2001
8. L.H.A. Leunissen, J. Bekaert, Y. Aksenov, V. Philipsen, R. Jonckheere, K. Ronse, "Impact of hyper-NA mask properties on ArF immersion lithography", proc. STS, p. 1-15, 2004
9. H.Ichikawa, H.Kikuta, "Numerical feasibility study of the fabrication of subwavelength structure by mask lithography", J.O.S.A. A vol.18, No.5, 2001
10. 1 lithography patterning option for the 90nm and 65nm nodes", proc. SPIE, vol. 5130, p. 812-828, 2003.