3D rigorous simulation of mask induced polarization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 567-575

  Wei, Xiuhong ^a   Urbach, H P ^b   Wachters, Arthur ^b   Aksenov, Yuri ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

3D modeling; High NA; Mask topography; Polarization; Rigorous simulation

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; IMAGE ANALYSIS; LIGHT POLARIZATION; MAXWELL EQUATIONS; PROBLEM SOLVING; THREE DIMENSIONAL;

3D MODELING; HIGH NA; MASK TOPOGRAPHY; RIGOROUS SIMULATION;

MASKS;

EID: 25144481776     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.597732     Document Type: Conference Paper

References (3)

1. Andrew Estroff, "Mask induced polarization," Proc. SPIE 5377, (2004).
2. J. P. Berenger, "A perfectly matched layer for the absorption of electromagnetic waves", J. Comput. Phys. 114, 185-200 (1994).
3. 3", Numer. Math. 35, 315-341 (1980).