Low-temperature crystallization of tantalum pentoxide films under elevated pressure

Journal of the European Ceramic Society

Volumn 26, Issue 13, 2006, Pages 2753-2759

  Lu, Chung Hsin ^a   Wu, Chung Han ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Films; Ta2O5; X ray methods

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; CRYSTALLIZATION; HIGH PRESSURE EFFECTS; INTERDIFFUSION (SOLIDS); PERMITTIVITY; SUBSTRATES; THIN FILMS;

ATMOSPHERIC PRESSURE ANNEALING; HIGH-PRESSURE CRYSTALLIZATION PROCESS; TANTALUM PENTOXIDE; THERMAL BUDGET;

TANTALUM COMPOUNDS;

ANNEALING; ATMOSPHERIC PRESSURE; CRYSTALLIZATION; HIGH PRESSURE EFFECTS; INTERDIFFUSION (SOLIDS); PERMITTIVITY; SUBSTRATES; TANTALUM COMPOUNDS; THIN FILMS;

EID: 33745677716     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2005.07.054     Document Type: Article

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