A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5533, Issue , 2004, Pages 47-57

  Kakutani, Yukinobu ^a   Niibe, Masahito ^a   Kakiuchi, Kazuya ^a   Takase, Hiromitsu ^b   Terashima, Shigeru ^b   Kondo, Hiroyuki ^b   Matsunari, Shuichi ^b   Aoki, Takashi ^b   Gomei, Yoshio ^b   Fukuda, Yasuaki ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Contamination; EUVL; Multilayer mirror; Radiation damage; Reflectance

Indexed keywords

CONTAMINATION; LIGHT REFLECTION; MASS SPECTROMETERS; MIRRORS; PHOTOEMISSION; PHOTOLITHOGRAPHY; RADIATION DAMAGE; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EUV LITHOGRAPHY (EUVL); LONG UNDULATORS (LU); MULTILAYER MIRRORS (MLM); QUADRUPOLE MASS SPECTROMETERS (QMS);

OPTICAL SYSTEMS;

EID: 20144380932     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.559395     Document Type: Conference Paper

References (4)

1. B. Mertens, B. Wolschrijn, R. Jansen, N. Koster, M. Weiss, M. Wedowski, R. Klein, T. Bock, and R. Thornagel. Proceedings of SPIE 5037 (2003) 95.
2. S. Bajt, H. N. Chapman, N. Nguyan, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham. Proceedings of SPIE 5037 (2003) 236.
3. The ray trace code entitled 'Ray Trace for windows', http://okutsu. spring8.or.jp/RTW/
4. Y. Gomei, to be submitted to Jpn. J. Appl. Phys.