Size effects in the nanoindentation of silicon at ambient temperature

Philosophical Magazine

Volumn 86, Issue 25-26, 2006, Pages 4069-4080

  Ge, D ^a   Minor, A M ^a   Stach, E A ^a   Morris Jr , J W ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Lawrence Berkeley National Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDENTATION; PLASTICITY; RELAXATION PROCESSES; SILICON WAFERS; SINGLE CRYSTALS; THERMAL EFFECTS;

METASTABLE PHASES; NANOINDENTATION; SINGLE CRYSTAL WAFERS; ULTRAFINE-GRAINED MIXTURE;

SILICON;

EID: 33745644044     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786430600586507     Document Type: Article

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