Durable anti-stiction coatings by Molecular Vapor Deposition (MVD)

2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Volumn , Issue , 2005, Pages 347-350

  Kobrin, Boris ^a   Chinn, Jeff ^a   Ashurst, Robert W ^b  

^a Applied Microstructures Inc   (United States)

^b AUBURN UNIVERSITY   (United States)

Author keywords

Anti stiction coating; MEMS; Molecular Vapor Deposition; MVD; Self assembled monolayer

Indexed keywords

ANTI-STICTION COATINGS; MEMS; MOLECULAR VAPOR DEPOSITION (MVD); MVD;

MICROELECTROMECHANICAL DEVICES; MOLECULAR DYNAMICS; PLASTICS; SELF ASSEMBLY; SURFACE CHEMISTRY; SURFACE TREATMENT; VAPOR DEPOSITION;

COATINGS;

EID: 32144435105     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. Molecular Vapor Deposition (MVD) is a trademark of Applied MicroStructures, Inc.
2. W. R. Ashurst, C. Yau, C. Carraro, R. Maboudian, M. T. Dugger, "Dichlorodimethylsilane as an anti-stiction monolayer for MEMS: a comparison to the octadecyltrichlorosilane self-assembled monolayer", J. Microelectromechanical Systems, 10, 41-49, 2001.
3. T. M. Mayer, M.P. de Boer, N.D. Shinn, P.J. Clews, "Chemical vapor deposition of fluoroalkylsilane monolayer films", J. Vac. Sci. Technol. (B), 18, 2433-2440, 2000.
4. W. R. Ashurst, C. Carraro, R. Maboudian, W. Frey, "Wafer level anti-stiction coatings for MEMS", Sensors and Actuators (A), 104, 213-221, 2003.
5. Thesis, Elizabeth Parker, UC-Berkeley, 2004. (eparker@kcp.com) Patent Pending, Applied MicroStructures, Inc.
6. Lier, K.P., The Chemistry of Silica, John Wiley and Sons, New York, 1979
7. Unpublished work: W.R. Ashurst - UC Berkeley (Currently at Auburn University)